Raith EBPG 5150 E-beam Writer

Location: Lower Level, Room 051A

The Raith EBPG 5150 is a 100 kV electron beam lithography system with a 125 MHz pattern generator, 1 mm main field size, and beam current up to 350 nA for high speed and high resolution lithography. It can accept substrates up to 5" and is capable of sub 10 nm resolution and alignment accuracy.