CVD Equipment 1034 Atmospheric Furnaces

Location: Upper Level Cleanroom, Room 176

The three-stack CVD Equipment 1034 atmospheric furnace system provides oxidation and annealing capabilities needed for device fabrication on 4" wafers. The top tube (Tube 1), which is used only for silicon oxidation, can also be connected to a bubbler for wet oxidation processes. The middle tube (Tube 2) is designated for metal annealing in Ar, N₂, or forming gas. The bottom tube (Tube 3) is restricted to general (but no metal) use processing in Ar.