Semi-Tool Spin Rinse Dryers

Location: Upper Level Cleanroom, Rooms 184 and 176


There are two spin rinse dryers in MNFL cleanroom, one designated only for Si wafers after RCA cleaning in thermal bay and second one located in the wet processing bay. Both systems use a programmable recipe to automatically process wafers. The standard process uses deionized water to rinse and nitrogen to dry whole cassette of 4" Si wafers automatically.


Please contact Roman Akhmechet for more information.